Myfab User Meeting 2011 Program

Myfab User Meeting

Chalmers, Gothenburg April 12 - 13, 2011

Tuesday April 12

RunAn in Chalmers Kårhus/Student building, close to Chalmers main entrance


09.00 Registration, coffee, Sign up for lab tours.  Mounting of posters in MC2 09.00 – 10:30. 


10:30 – 10:45 Opening address. About MUM’11, some notes on Myfabs and its development, practical issues. Stefan Bengtsson and Thomas Swahn.


10:45 – 12:30 Plenary session with invited presentations highlights from within Myfab. 

Invited: Francis Balestra, MINATEC, Grenoble: "Integration of European nanofabrication laboratories"

Myfab highlight: Jan Grahn, Chalmers: “Low power low noise HEMT – cutting edge results at Myfab


12.30 – 14:00 Lunch


14:00 – 15:30 Plenary sessions, three presentation: 

Myfab invited Highlight: Shili Zhang 

Myfab invited Highlight: Anders Ljunggren, ÅAC Microtec

Myfab invited Highlight: Per-Erik Hellström: ”Nanodevices in silicon and related materials”


Coffee/Te available at 15:30

16:00 – 18:00 Poster Session in MC2 Canyon and lab tours to Myfab MC2 Nanofabrication laboratory. Group visits 16:00 – 16:40, 16:20 – 17:00, 16:40 – 17:20, 17:00 – 17:40, 17:20 – 18:00, 17:40 – 18:20. 

19:00 Dinner at Universeum 

Welcome toast, guided tours and dinner at Universeum. By foot: see map. By tram: take tram number 6 och 8 from Chalmers main entrance, Chalmersplatsen, in the direction into the tunnel, to next stop at Korsvägen. Universeum is located next to Korsvägen within sight. 


Wednesday April 13

RunAn and smaller rooms in Chalmers Kårhus

09:00 – 12:00 Thematic sessions (50 minutes each): tutorials and discussions. 

Three rooms (Ledningsrummet, Valdemar, Catella), parallel sessions. 


Coffee available from 09:50.



09:00-09:50 Lena Klintberg: “The back-end processing line at Ångström”

10:00-10:50 Christoph Henkel: ”Atomic Layer Deposition (ALD)” 

11:00-11:50 Mats Hagberg: “Dry etching methods”  



09:00-09:50 Piotr Jedrasik: “High Resolution Electron Beam Lithography”

10:00-10:50 Anders Holmberg: “EBL and related processes at Albanova for sub-15-nm high-aspect-ratio structures” 

11:00-11:50 Anders Hallén: “MEIS and other ion-beam analysis methods”



09:00-09:50 Per Wehlin: “Building of a web-based Quality System at the Myfab portal”

10:00-10:50  Carl Junesand: ”Heteroepitaxy of mismatched materials: Aggravations, approaches and applications" 

11:00-11:50  Sofia Svedhem, Rickard Arvidsson and Ulf Södervall: “Aspects of Nanosafety within Myfab activities.” 


If the attendees is evenly distributed between the parallel sessions these three rooms should work. If not the session with the largest number of attendees can move into RunAn.


12:00 – 13:15  Lunch


13:15 – 14:00 Invited: Peter Parbrook, Tyndal National Institute, Cork, Ireland. “III-Nitride Semiconductor Optoelectronics: Moving from the Visible to the Ultra-Violet”

14:00 – 14:30  Myfab invited highlight: Adolf Schöner, Acreo: ”Recent progress in SiC device processing” 


14:30 – 14:45  Concluding remarks.