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Thermal processes

  Thermal Processes
Thermal processing includes a diversity of processes where high temperatures are used. Hence, annealing may be necessary to activate dopants after ion implantation or to alloy contacts after metal deposition, while treatment in a chemically active atmosphere is used to change the surface layer, e.g., by diffusion of dopants and thermal oxidation of a Si surface.
 
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 NameManufacturerModel
DetailsB5-BoronBruce BDF4Diffusion-boron doping Silicon
DetailsB6-FGABruce BDF4Diffusion-Forming gas anneal Silicon
DetailsB8-Wet-DryBruce BDF4Diffusion-Wet oxidation Silicon
DetailsC2-DryBruce BDF4Diffusion-Dry oxidation Silicon
DetailsC3-Wet-DryBruce BDF4Diffusion-Wet oxidation Silicon
DetailsC4-G-FGABruce BDF4Diffusion-Forming gas anneal Silicon (gold)
DetailsRTAMattson100 RTP Systems
DetailsYes-ugnYESPolyimide Bake Oven YES-450PB8-2/6-2
DetailsPeoPEOPEO-603 Anneal furnace III/V (ramp)
DetailsAPL-Tube 1Harmbridge Diffusion FurnaceNoble III Thermal oxidation - Diffusion
DetailsAPL-Tube 2Harmbridge Diffusion FurnaceNoble III Thermal oxidation - Diffusion
DetailsAPL-Tube 3Harmbridge Diffusion FurnaceNoble III Metal sintering
DetailsBake 5MemmertU 26
DetailsActivatorCentrothermActivator 150 (SiC anneal)
DetailsT1-Oxide 1150CThermco5200
DetailsT2-Oxide 1250CThermco5200
DetailsT3-Gate oxThermco5200
DetailsT4-FGAThermco5200